Hydrodynamic and Chemical Modeling of a Chemical Vapor Deposition Reactor for Zirconia Deposition
نویسندگان
چکیده
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ژورنال
عنوان ژورنال: Journal de Physique III
سال: 1997
ISSN: 1155-4320,1286-4897
DOI: 10.1051/jp3:1997222